An approach to fabricate pure metallic Ni-Ni and metallic oxide Ni-NiO-Ni nanocontacts by repeatable microfabrication method
by H.X. Wei, T.X. Wang, H. Wang, X.F. Han, M.A. Bari, J.M.D. Coey
International Journal of Nanotechnology (IJNT), Vol. 4, No. 1/2, 2007

Abstract: Metallic nickel films of thickness between 3 nm and 50 nm on SiO₂/Si substrate were first deposited by magnetron sputtering system. T-shape nanocontacts for both pure metallic Ni-Ni and metallic oxide Ni-NiO-Ni were then patterned by electron-beam and ultra-violet lithography combined with focused ion beam milling method. The dimension of each of the nanocontacts along the horizontal direction with the thin film was systematically changed from 10 nm to 50 nm. Different oxidisation methods were used to investigate the influence of oxygen on transport properties upon the metallic oxide Ni-NiO-Ni nanocontacts. Magnetoresistances were observed lower than 1% at room temperature in both series. No evidence was found of large ballistic magnetoresistance based on such repeatable microfabrication methods.

Online publication date: Mon, 05-Feb-2007

The full text of this article is only available to individual subscribers or to users at subscribing institutions.

 
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.

Pay per view:
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.

Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Nanotechnology (IJNT):
Login with your Inderscience username and password:

Username:        Password:          Forgotten your password?

Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.

If you still need assistance, please email subs@inderscience.com