Plasma assisted vapor deposition processes
by R.F. Bunshah, C.V. Deshpandey
International Journal of Materials and Product Technology (IJMPT), Vol. 8, No. 2/3/4, 1993

Abstract: Plasma Assisted Vapor Deposition Processes are used for the deposition of various compounds dielectric materials, novel materials (like diamond and cubic boron nitride) for a large number of applications in optics, microelectronics, tribology etc. This paper discusses these processes in terms of the interaction between the plasma parameters and the process parameters. Important distinctions between the various processes emerge. The all important role of plasma volume chemistry in these processes is discussed.

Online publication date: Thu, 04-Nov-2010

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