Selection of metrology and manufacturing process for a functional surface Online publication date: Sun, 06-Oct-2013
by S.K. Ramasamy; J. Raja; H. Peruru
International Journal of Precision Technology (IJPTECH), Vol. 3, No. 3, 2013
Abstract: With the rapid evolution of new engineered surfaces, there is a strong need for developing strategies for selection of right manufacturing and metrology tools, in order to manufacture and measure/characterise these surfaces at different scales. Recent technology trends like miniaturisation and multi-scale modelling have further increased the need to better understand manufacturing and metrology equipments to provide functional surfaces. Amplitude-wavelength (AW) diagrams have been used to characterise instruments and processes in a common domain. Typically AW diagrams are generated assuming that within the limiting lines, the capability of the system is uniform. But various studies have revealed non-linearity in the capabilities, which can be included in the AW diagrams using a third axis and developing 3D AW diagrams. This paper discusses the proposed methodology to develop 3D AW diagrams for measurement systems, using instrument transfer function (ITF) as a main contributor to system capability.
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