Effect of annealing on the physical properties of WO₃ thin films
by M. Bujji Babu; D. Divya Dixit; K.V. Madhuri
International Journal of Nano and Biomaterials (IJNBM), Vol. 7, No. 1, 2017

Abstract: Tungsten trioxide (WO₃) thin films were deposited by electron beam evaporation technique at an oxygen partial pressure of 2 × 10⁻⁴ mbar and at different substrate temperatures ranging from room temperature (RT) to 450°C. The films were annealed at 400°C about 2 hours and the properties were studied systematically. The x-ray diffraction studies show the diffraction peak of (320) at 2θ = 44.07° which indicate the orthorhombic phase of WO₃ and also the other peaks represent the hexagonal phase of WO₃. Due to annealing of the films, the monoclinic phase is also observed. The surface morphology of WO₃ thin films was investigated by using atomic force microscopy and scanning electron microscopy, which supports the above data. The energy-dispersive x-ray (EDX) compositional analysis confirmed the presence of W and O. The optical properties were studied by UV-VIS spectrophotometer and hence the bandgap values are calculated.

Online publication date: Wed, 17-Jan-2018

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