Title: Fabrication and performances of TaN@(Al/CuO) thin film

Authors: Xiao-Ming Ren; Ke-Xin Yu; Jing-Xin Zhang; Lan Liu; Wei Liu; Rui-zhen Xie; Wei Ren

Addresses: Science and Technology on Applied Physical Chemistry Laboratory, Shaanxi Applied Physics and Chemistry Research Institute, Xi'an 710061, China ' Science and Technology on Applied Physical Chemistry Laboratory, Shaanxi Applied Physics and Chemistry Research Institute, Xi'an 710061, China ' Science and Technology on Applied Physical Chemistry Laboratory, Shaanxi Applied Physics and Chemistry Research Institute, Xi'an 710061, China ' Science and Technology on Applied Physical Chemistry Laboratory, Shaanxi Applied Physics and Chemistry Research Institute, Xi'an 710061, China ' Science and Technology on Applied Physical Chemistry Laboratory, Shaanxi Applied Physics and Chemistry Research Institute, Xi'an 710061, China ' Science and Technology on Applied Physical Chemistry Laboratory, Shaanxi Applied Physics and Chemistry Research Institute, Xi'an 710061, China ' Science and Technology on Applied Physical Chemistry Laboratory, Shaanxi Applied Physics and Chemistry Research Institute, Xi'an 710061, China

Abstract: To reduce the ignition energy of the reactive multilayer films and improve the ignition performance, this paper designed three types of Al/CuO, and Al/CuO was combined with TaN by micro-electro-mechanical system (MEMS) technology to prepare TaN@(Al/CuO). The experimental results were obtained by high-speed photography of the flame height. The ignition experiment results showed that: when the firing voltage was 50 V and the capacitance was 33 μf, the flame height of the Al/CuO (50 nm/100 nm) was the highest with a flame height of about 16 mm; the flame height increased with the increase of voltage, and the flame duration also increased under the same conditions.

Keywords: TaN; Al/CuO; micro-electro-mechanical system; MEMS; firing voltage; flame height.

DOI: 10.1504/IJNM.2023.131889

International Journal of Nanomanufacturing, 2023 Vol.18 No.2, pp.39 - 45

Received: 09 Nov 2022
Accepted: 18 Jan 2023
Published online: 04 Jul 2023 *

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