Title: Carbon diffusion into steel during diamond chemical vapour deposition

Authors: V.F. Neto, R. Vaz, M.S.A. Oliveira, J. Gracio, N. Ali, C.A.A. Ghumman, Orlando M.N.D. Teodoro

Addresses: TEMA – Centre for Mechanical Technology and Automation Department of Mechanical Engineering University of Aveiro 3810-193 Aveiro, Portugal. ' TEMA – Centre for Mechanical Technology and Automation Department of Mechanical Engineering University of Aveiro 3810-193 Aveiro, Portugal. ' TEMA – Centre for Mechanical Technology and Automation Department of Mechanical Engineering University of Aveiro 3810-193 Aveiro, Portugal. ' TEMA – Centre for Mechanical Technology and Automation Department of Mechanical Engineering University of Aveiro 3810-193 Aveiro, Portugal. ' School of Computing, Engineering and Physical Sciences University of Central Lancashire Preston, PR1 2HE, United Kingdom. ' CEFITEC, Department of Physics Faculty of Science and Technology New University of Lisbon 2829-516 Caparica, Portugal. ' CEFITEC, Department of Physics Faculty of Science and Technology New University of Lisbon 2829-516 Caparica, Portugal

Abstract: In this study, we investigate the diffusion of carbon (C) and other elements into steel substrates (Impax Supreme™) during diamond chemical vapour deposition (CVD). The substrate temperature varied from 700 to 850°C by plasma power manipulations to enable the correlation of substrate temperature with diffusion length and depth of the above mentioned critical elements into steel during film growth conditions. Methane concentration is also a parameter which has been considered during the parametric analysis. The crystalline compounds formed during the diamond growth process were studied using XRD analysis. In addition, SIMS technique is used with depth profiling to monitor the diffusion of elements induced by the process. The results obtained enabled to improve traditional understanding about the mechanisms relating to diamond deposition on steel substrates using CVD processes.

Keywords: carbon diffusion; steel substrates; chemical vapour deposition; diamond CVD.

DOI: 10.1504/IJNM.2008.018945

International Journal of Nanomanufacturing, 2008 Vol.2 No.3, pp.192 - 203

Published online: 25 Jun 2008 *

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