Title: Design and sensitivity analysis of Fresnel domain computer generated holograms

Authors: Jose A. Dominguez-Caballero, Satoshi Takahashi, George Barbastathis, SungJin Lee

Addresses: Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA. ' Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA. ' Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA. ' Mechatronics and Manufacturing Tech Center, Samsung Electronics Co. Ltd., 416, Metan-dong, Youngtong-gu, Suwon, Gyeonggi-do, 443-742, South Korea

Abstract: An iterative algorithm used for the design and optimisation of a binary phase computer generated hologram for high-resolution lithography in on-axis and off-axis geometries is presented. A sensitivity analysis is performed to estimate the effect of CGH manufacture errors using electron-beam writing.

Keywords: computer generated holograms; CGH; Fresnel domain; iterative algorithms; electron-beam writing; lithography; sensitivity analysis; optimisation; on-axis/off-axis geometries.

DOI: 10.1504/IJNM.2010.034784

International Journal of Nanomanufacturing, 2010 Vol.6 No.1/2/3/4, pp.207 - 218

Published online: 22 Aug 2010 *

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