Title: Technical Note: Excimer laser-induced etching of semiconductors and metals

Authors: J .-L. Peyre, D. Riviere, C. Vannier, G. Villela

Addresses: Laboratoires de Marcoussis, Marcoussis, France. ' Laboratoires de Marcoussis, Marcoussis, France. ' Laboratoires de Marcoussis, Marcoussis, France. ' Laboratoires de Marcoussis, Marcoussis, France

Abstract: As the feature sizes of microelectronic and optoelectronic components continue to decrease, there has been increased interest in developing new techniques for etching the materials used to construct these highly integrated components. Features of the new techniques now being investigated include etching with neutral species, maskless processing, material selectivity and reduced electrical damage.

Keywords: microelectronics; optoelectronics; excimer lasers; laser etching; semiconductors; metals; neutral species; maskless processing; material selectivity; electrical damage.

DOI: 10.1504/IJMPT.1990.036661

International Journal of Materials and Product Technology, 1990 Vol.5 No.3, pp.301 - 310

Published online: 05 Nov 2010 *

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