Title: Schottky emission effect in surface topography: method and application

Authors: Albert Weckenmann, Zhengshan Sun, Alexander Schuler

Addresses: Chair Quality Management and Manufacturing Metrology, University Erlangen-Nuremberg, Naegelsbachstrasse 25, 91052 Erlangen, Germany. ' Chair Quality Management and Manufacturing Metrology; Erlangen Graduate School in Advanced Optical Technologies (SAOT), University Erlangen-Nuremberg, Naegelsbachstrasse 25, 91052 Erlangen, Germany. ' Chair Quality Management and Manufacturing Metrology, University Erlangen-Nuremberg, Naegelsbachstrasse 25, 91052 Erlangen, Germany

Abstract: Presented here is an application of Schottky emission effect in surface topography. Since using current transfer mechanism can detect the metal or semiconductor surface structures in high resolution without contact, the tendency of Schottky emission in surface metrology is obvious. In this study, Schottky emission property in practical condition is compared both theoretically and practically into detail with tunnelling effect and field emission in order to distinguish the observed phenomena. A new developed probing system holding a thick electrical probe is exemplified to demonstrate the Schottky emission effect application in surfaces study. Future prospects of applying Schottky emission to manufacturing metrology are overviewed.

Keywords: scanning tunnelling microscopy; STM; Schottky emission; surface metrology; coordinate probing systems; surface topography; electrical probes; manufacturing metrology; nanopositioning; nanotechnology.

DOI: 10.1504/IJNM.2011.040716

International Journal of Nanomanufacturing, 2011 Vol.7 No.2, pp.93 - 103

Received: 27 Oct 2010
Accepted: 11 Jan 2011
Published online: 28 Feb 2015 *

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