Title: Height measurement of single nanoparticles based on evanescent field modulation

Authors: Takayuki Kurihara; Ryuichi Sugimoto; Ryota Kudo; S. Takahashi; K. Takamasu

Addresses: Department of Precision Engineering, School of Engineering, The University of Tokyo, Hongo 7-3-1, Bunkyo, Tokyo, Japan ' Department of Precision Engineering, School of Engineering, The University of Tokyo, Hongo 7-3-1, Bunkyo, Tokyo, Japan ' Department of Precision Engineering, School of Engineering, The University of Tokyo, Hongo 7-3-1, Bunkyo, Tokyo, Japan ' Department of Precision Engineering, School of Engineering, The University of Tokyo, Hongo 7-3-1, Bunkyo, Tokyo, Japan ' Department of Precision Engineering, School of Engineering, The University of Tokyo, Hongo 7-3-1, Bunkyo, Tokyo, Japan

Abstract: We propose a novel height measurement method for single nanoparticles illuminated by an evanescent field in the total internal reflection microscopy scheme. The method utilises the scattered light intensity response to incident angle modulation. We introduced a physical model to derive a height measurement formula, and confirmed its validity through numerical simulations based on Maxwell's equation. We also verified the practical feasibility of the proposed method and confirmed that under an incident angle error of less than 0.1°, height measurement error of less than 10 nm could be achieved.

Keywords: height measurement; single nanoparticles; evanescent field modulation; nanoinspection; evanescent wave; particle measurement; near-field optics; total internal reflection microscopy; incident angle; Maxwell equation; chemical mechanical polishing; CMP; microfluidics; wafer inspection; nanomanufacturing; nanotechnology; numerical simulation.

DOI: 10.1504/IJNM.2012.051105

International Journal of Nanomanufacturing, 2012 Vol.8 No.5/6, pp.419 - 431

Received: 01 Dec 2011
Accepted: 19 Jul 2012
Published online: 21 Aug 2014 *

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