Title: Direct patterning of metal oxides by hard templates and atomic layer deposition

Authors: Hyunchul Kim; Changdeuck Bae; Hyun Suk Jung; Jang-Sik Lee; Hyunjung Shin

Addresses: Department of Energy Science, Sungkyunkwan University, 300 Cheoncheon-dong, Suwon, Gyeonggi-do 440-746, South Korea ' Institute of Applied Physics, University of Hamburg, Jungiusstr. 11, 20335, Hamburg, Germany ' School of Advanced Materials Science & Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746, South Korea ' Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), San 31 Hyoja-dong, Nam-gu, Pohang, Kyungbuk 790-784, South Korea ' Department of Energy Science, Sungkyunkwan University, 300 Cheoncheon-dong, Suwon, Gyeonggi-do 440-746, South Korea

Abstract: We describe a procedure for one-step patterning of thin films of metal oxides (TiO₂, Al₂O₃, and ZnO) using reusable hard templates and atomic layer deposition (ALD). This procedure, called contact area lithography (CAL), was inspired from an idea of pattern transfer at a contact area, which realises high patterning fidelity, and enables a universal approach for the nano/micrometre scale patterning of both inorganic and organic thin films, such as self-assembled monolayers [1]. Patterned hard silicon oxide was employed as a hard template and water-induced bridge formation is attributed to the origin of the observed adhesive contact force between the substrates and the templates during the pattern transfer. Non-contacted areas were served as growth sites for thin layers of various metal oxides by using ALD. CAL is a simple and universal method to form hard oxide thin film patterns without incorporation of resistive layers, and should have potential for applications in micro/nano electronics, optoelectronics, flexible electronics, biochips, and complex nanostructure fabrication.

Keywords: contact area lithography; atomic layer deposition; metal oxides; hard templates; direct patterning; hard oxide thin films; thin film patterns; nanotechnology.

DOI: 10.1504/IJNT.2013.054211

International Journal of Nanotechnology, 2013 Vol.10 No.8/9, pp.692 - 701

Published online: 01 Aug 2013 *

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