Title: Effect of ethylene glycol variation on silica antireflective coatings

Authors: Ruimin Jin; Xinfeng Guo; Zhiduan Cai; Limin Cang; Tao Yan

Addresses: Institute of Solar Cell Nanyang Institute of Technology, Henan 473004, China; Postdoctoral workstation Ancai Hi-Tech Co., Ltd., Anyang 455000, China ' Institute of Solar Cell Nanyang Institute of Technology, Henan 473004, China ' Postdoctoral workstation Ancai Hi-Tech Co., Ltd., Anyang 455000, China ' Postdoctoral workstation Ancai Hi-Tech Co., Ltd., Anyang 455000, China ' Postdoctoral workstation Ancai Hi-Tech Co., Ltd., Anyang 455000, China

Abstract: A new type of sol-gel process addition of ethylene glycol has been developed. Sol-gel derived bulk and thin films were prepared from different compositions containing varying concentrations of ethylene glycol from 5% to 15% at constant water (H₂O)/tetraethyl-orthosilicate (TEOS) ratio. Scanning electronic microscope (SEM) was carried out to monitor the effects of concentration of ethylene glycol on the internal environment of sol-gel materials. Sol-gel thin films, prepared by rotating coating technique were depicted uniform and cracked surface at rotating speed 2,000 r/min (high speed) and 800 r/min (low speed) respectively. It was shown that an antireflective film produced by incorporation of ethylene glycol in the precursor solution is a more effective method to effect the uniformly porous structures of SiO₂ thin film on the glass substrate. The surface of the film on glass substrates is seen to exist in different conditions with different compositions of ethylene glycol.

Keywords: sol-gel; nanotechnology; ethylene glycol; silica antireflective coatings; thin films; glass substrates.

DOI: 10.1504/IJNM.2013.056055

International Journal of Nanomanufacturing, 2013 Vol.9 No.3/4, pp.295 - 302

Received: 28 Sep 2012
Accepted: 16 Jan 2013
Published online: 31 Mar 2014 *

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