Title: Study on nanoparticles embedded multilayer gate dielectric MOS non-volatile memory devices

Authors: Amretashis Sengupta; Chandan Kumar Sarkar

Addresses: Department of Electronics & Telecommunication Engineering, Jadavpur University, Kolkata 700 032, India ' Department of Electronics & Telecommunication Engineering, Jadavpur University, Kolkata 700 032, India

Abstract: Here, we present a computational study on stacked multilayer nanoparticles embedded gate dielectric MOS non-volatile memory devices. Two device structures, one with a pure SiO₂ tunnel oxide and other with a stacked HfO₂-SiO₂ tunnel oxide were compared. The Au nanocrystals were assumed embedded in a Si₃N₄ layer. The electrical parameters of the composite multilayer were evaluated using Maxwell-Garnett theory and virtual crystal approximation. From the WKB approximation, the direct and the Fowler-Nordheim tunnelling currents were evaluated, and subsequently the I-V characteristics and the flatband voltage shifts were also simulated. The flatband shift simulations were compared with recent experimental results.

Keywords: MOS; multilayer gate; nanoparticles; Fowler-Nordheim tunnelling; nanotechnology; non-volatile memory devices; nanocrystals; electrical parameters; I-V characteristics; flatband voltage shifts; simulation.

DOI: 10.1504/IJNT.2014.065133

International Journal of Nanotechnology, 2014 Vol.11 No.12, pp.1073 - 1080

Published online: 06 Feb 2015 *

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