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Role of stress/strain mapping and random dopant fluctuation in advanced CMOS process technology nodes
T.P. Dash; J. Jena; E. Mohapatra; S. Das; S. Dey; C.K. Maiti
International Journal of Nano and Biomaterials (IJNBM), 2020 Vol.9 No.1/2, pp.18 - 33
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