The reactive gas pulsing process for tuneable properties of sputter deposited titanium oxide, nitride and oxynitride coatings
by Nicolas Martin, Aurelien Besnard, Fabrice Sthal, Jamal Takadoum
International Journal of Materials and Product Technology (IJMPT), Vol. 39, No. 1/2, 2010

Abstract: TiO_x, TiN_y and TiO_xN_y thin films were deposited by reactive sputtering. The reactive gas pulsing process was implemented to tune the chemical composition and consequently, the characteristics of the films. For TiO_x coatings, oxygen concentration was progressively modified from pure titanium to TiO₂ compound. Similarly, a gradual decrease of the deposition rate and a controlled modulation of the chemical composition of TiN_y films (y between 0 and 1.05) were easily reached. A reverse evolution of the oxygen and nitrogen contents was produced in TiO_xN_y films, which was correlated with the smooth transition from metallic to semiconducting behaviours.

Online publication date: Sat, 31-Jul-2010

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