Nano-silver arrays assisted chemical etching and catalysed texturing of silicon wafers for solar cells Online publication date: Mon, 31-Mar-2014
by Zongcun Liang; Haifeng Zhang; Senrong Chen
International Journal of Nanomanufacturing (IJNM), Vol. 9, No. 3/4, 2013
Abstract: Metal assisted chemical etching (MACE) is a neoteric method for texturing treatment of silicon surface. In this paper, a low-cost method used for preparing nano-silver particles for catalysing to form texturing of silicon wafers is introduced. Polyethylene glycol is utilised as reductant in the AgNO3 solution to prepare nano-silver particles and then the nano-silver particles are transferred to the p-type (1 0 0) silicon surface. After immersing the samples in the etchant consisted of HF and H2O2, the reflectivity of the silicon wafers could reduce to 5.79% throughout the spectrum of the wavelength from 400 to 1,000 nm. The optimal ratio of each constituent of the etchant is HF (49%): H2O2 (30%): H2O = 1:2:10 in volume, and the optimal etching time is 3 min.
Existing subscribers:
Go to Inderscience Online Journals to access the Full Text of this article.
If you are not a subscriber and you just want to read the full contents of this article, buy online access here.Complimentary Subscribers, Editors or Members of the Editorial Board of the International Journal of Nanomanufacturing (IJNM):
Login with your Inderscience username and password:
Want to subscribe?
A subscription gives you complete access to all articles in the current issue, as well as to all articles in the previous three years (where applicable). See our Orders page to subscribe.
If you still need assistance, please email subs@inderscience.com